China develops prototype EUV machine

Reuters reported in December that Chinese scientists have developed a prototype of an extreme ultraviolet (EUV) lithography machine, built by a team of former engineers from ASML. The effort has been described as China's version of the Manhattan Project, highlighting the strategic importance of domestic chip manufacturing capabilities. This development comes amid ongoing tensions over ASML's export controls and U.S. concerns that an EUV machine may have already reached China.